At 18:31 -0500 24/1/03, AnBeyer@xxxxxxx wrote:
>Hello everyone-According to the Compact Photo Lab Index, Pan X should be used
>at ASA 80 daylight, 64 tungsten for positive slides. It was then supposed to
>be processed with the Kodak Direct Positive Film Developing Outfit. Does
>anyone have the chemistry formulations? I don't think this kit is available
>any longer.
Superseded:
http://www.kodak.com/cluster/global/en/professional/support/techPubs/j87/j87.jhtml
KODAK T-MAX 100 Direct Positive Film Developing Outfit
If the above URL breaks across lines of your message window, or doesn't
work as a clickable link in your emailer, copy and paste it to your browser
windoe, being careful not to have any spaces or lost characters.
--
Cheers from Godzone,
Michael Kopp
Wellington, New Zealand
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